Facility
Purpose of the beamline BL11
Beamline BL11 was constructed for deep X-ray lithography in the LIGA process. This beamline is used for fabricating submicron order microstructure with high aspect ratio, and have spectra ranging of photon energy from 2 to 7 keV. The second mirror is bent elliptically using a bending mechanism in order to change the focusing beam spot. The exposure is carried out with the workpiece held in a specially manufactured nine parts operation stage to fabricate 3D microstructure.
BL11
Reflectivity of two Pt-coated mirrors
200μm thickness Be window for cut-off low energy photons
Reduce of local heat using He gas
Specification of mirrors and filter
Mirrors
| Optical element | Type | Surface Roughness | Coating | S bstrate | Size L × W(mm) |
|---|---|---|---|---|---|
| M1 | Plane | 2.4 Å RMS | Pt | Si | 800×50 |
| M2 | Sagittal Cylinder |
5.23 Å RMS | Pt | Si | 600×70 |
Filter
Be: 200μm
Spectrum
Radiation spectrum (1.0GeV）
Radiation spectrum (1.5GeV)
Endstation
X-ray exposure stage for 3D microstructure
Sample size: 4 inch wafer(Max.)
Exposure area: 50mm(Horizontal) × 80mm(vertical)
Vacuum: 1atm (He gas)
Example of fabrication: 3D chip coil
