‘Û‰ï‹c(Int'l. Conference)

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‚PD ‘Û‰ï‹ci2003 ~ j

 

ƒ‚Q‚O‚P9”N„

Masahito Niibe, Takashi Tokushima, Tomohiko Kono, Yusuke Hashimoto, Yuka Horikawa, and Hiroaki Yoshida:

“Development of On-site Cleaning Method of Carbon Contamination with Atomic Hydrogen”

The 23rd Hiroshima International Symposium on Synchrotron Radiation, Higashi-Hiroshima, 7-8, March 2019.

 

ƒ‚Q‚O‚P8”N„

Yuki Yoshitani, Retsuo Kawakami, Hirofumi Koide, Naoki Takami, Masahito Niibe, Yoshitaka Nakano, Chisato Azuma and Takashi Mukai :
“Effect of Atmospheric-Pressure O2 Plasma-Assisted Annealing on Photocatalytic Activity of TiO2 Nanoparticles,
Proceedings of International Symposium of Dry Process 2018, 255-256, Nagoya, Nov. 2018.

 

Retsuo Kawakami, Yuki Yoshitani, Kimiaki Mitani, Naoki Takami, Hirofumi Koide, Norihiro Sugimoto, Masahito Niibe, Yoshitaka Nakano, Chisato Azuma and Takashi Mukai :
“Hydrophilic Modification of Polypropylene Film Surfaces Treated by Atmospheric-Pressure Air Plasma Jet,”  

Proceedings of International Symposium of Dry Process 2018, 253-254, Nagoya, Nov. 2018

 

R. Tsuji, H. Masutani, M. Niibe, Y. Haruyama, A. Heya, S. Nakajima, N. Matsuo, H. Fujisawa, S. Honda, S. Ito:

”Water Electrolyzing Catalyst of Pt and Fe, Ni, Ru-O Catalysts Deposited by Flame-Annealing on Carbon Electrode”

2018 Annual Nanotechnology Conf., Viena, Austria, Sep. 3-5 2018.

 

H. Masutani, R. Tsuji, M. Niibe, A. Heya, N. Matsuo, Y. Matsuo, S. Honda, S. Ito:

”Water Electrolysis using Flame-Annealed Pencil Carbon Electrode"

2018 Annual Nanotechnology Conf., Viena, Austria, Sep. 3-5 2018.

 

Masahito Niibe, Tetsuo Harada, Akira Heya, Takeo Watanabe, Naoto Matsuo:

”Removal of carbon contamination on easily-oxidizable-metal coated mirrors for synchrotron radiation beamlone using atomic hydrogen"

Inter’l. Conf. Hot Wire & Initiated Chemical Vapor Deposition (HWCVD10), Kitakyushu, Japan, 3-6, Sep. 2018.

 

Masahito Niibe, Tetsuo Harada, Akira Heya, Takeo Watanabe, Naoto Matsuo:

”Removal of carbon contamination on oxidation-prone metal-coated mirrors using atomic hydrogen"

Inter’l. Conf. Synchrotron Rad. Instrumentation (SRI 2018), Taipei Taiwan, 10-15, June 2018. 

 

ƒ‚Q‚O‚P7”N„

Masahito Niibe, Noritaka Takehira and Takashi Tokushima :

"Observation of B-K Emission and Absorption Spectra of Trace Boron Doped in HOPG",

The 8th International Symposium on Surface Science (ISSS-8), Tsukuba, Oct. 2017.

 

Masahito Niibe, Ryo Tanaka, Retsuo Kawakami, Yoshitaka Nakano and Takashi Mukai :

"Surface Structure Analysis of AlGaN Thin Films Damaged by Oxygen and Nitrogen Plasmas",

The 8th International Symposium on Surface Science (ISSS-8), Tsukuba, Oct. 2017.

 

Yoshitaka Nakano, Retsuo Kawakami and Masahito Niibe :

"Generation Behavior of Electrical Damage Introduced into n-GaN Films by CF4 Plasma Treatments",

29th International Conf. on Defects in Semiconductors (ICDS), Matsue, Aug. 2017.

 

Retsuo Kawakami, Kengo Fujimoto, Masahito Niibe, Yuma Araki, Yoshitaka Nakano and Takashi Mukai :

"TiO2 Thin Film Surfaces Treated by O2 Plasma in Dielectric Barrier Discharge with Assistance of Heat Treatment",

Proc. 14th International Symp. Sputtering & Plasma Processes, 274-277, Kanazawa, Jul. 2017.

 

Yoshitaka Nakano, Masahito Niibe and Retsuo Kawakami :

"Damage Introduced into n-GaN Films by CF4 Plasma Treatments",

9th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2017) and 10th Interational Conference on Plasma-Nano Technology & Science (IC-PLANTS2017), Aichi, Mar. 2017.

 

Masahito Niibe, Noritaka Takehira, and Tahashi Tokushima:

”Construction and Performance of the Compact Soft X-ray Emission Spectrometer at BL-09A in NewBUBARU SR Facility” (invited)

5th Annual Congress of AnalytiX-2017, 22-24 Mar. 2017, Fukuoka, Japan. 

 

T. Hisakuni, S. Suzuki, S. Honda, M. Niibe, M. Terasawa, Y. Higo, K. Niwase, H. Izumi, E. Taguchi, T. Iwata:

“Structural changes on neutron-irradiated highly oriented pyrolytic graphite under static high pressure and temperature”

Symp. on Surf. Sci. & Nanotechnol. (SSSN-Kansai), 24-25 Jan. 2017, Kyoto, Japan.

 

M. Kato,Y. Fujiwara, S. Honda, M. Terasawa, M. Niibe, M. Sakurai, N. Nishida, T. Tokui, K. Suzuki, K. Betsumiya, K. Niwase, K.-Y. Lee:

“Irradiation effect in multi-walled carbon nanotubes by highly charged ions”

Symp. on Surf. Sci. & Nanotechnol. (SSSN-Kansai), 24-25 Jan. 2017, Kyoto, Japan.

 

ƒ‚Q‚O‚P6”N„

Yoshitaka Nakano, Masahito Niibe, and Retsuo Kawakami:
“Electrical damage in n-GaN films treated by CF4 plasma”,
Proceedings of International Symposium of Dry Process 2016, pp.73--74, Sapporo, Nov. 2016. 

 

Masahito Niibe, Takashi Tokushima, Niritaka Takehira, Yuma Araki:

”A large take-off angle dependence of C-K emission spectra observed in highly oriented pyrolytic graphite”

39th inter’l Conf. on Vacuum Ultraviolet and X-ray Physics (VUVX2016), P_103, 3-8 July 2016, Zurich, Switzerland.

 

S. Honda, F. Ideno, Y. Muramatsu, M, Niibe, M. Terasawa, E.M. Gullikson and K.-Y. Lee:

”Soft X-ray Absorption Spectroscopy of Orientation, Oxygen Content, Chemical States of Ion-irradiated Vertically Aligned Multiwalled Carbon Nanotubes”

39th inter’l Conf. on Vacuum Ultraviolet and X-ray Physics (VUVX2016), P_168, 3-8 July 2016, Zurich, Switzerland.

 

Retsuo Kawakami, Masahito Niibe, Yoshitaka Nakano and Takashi Mukai:
“Effect of Ultraviolet Light-Assisted CF4 Plasma Irradiation on AlGaN Thin Film Surface”,
Proceedings of the 43rd International Symposium on Compound Semiconductors (ISCS2016), pp.MoP-ISCS-096_1--MoP-ISCS-096_2, Toyama, Jun. 2016.

 

Yoshitaka Nakano, Masahito Niibe and Retsuo Kawakami:
“Electrical Damage Investigation of n-GaN Films Treated by CF4 Plasma”,
Proceedings of the 43rd International Symposium on Compound Semiconductors (ISCS2016), pp.MoP-ISCS-LN-4_1--MoP-ISCS-LN-4_2, Toyama, Jun. 2016.

 

ƒ‚Q‚O‚P‚T”N„

Retsuo Kawakami, Masahito Niibe, Yoshitaka Nakano, Chisato Azuma and Takashi Mukai :
“Anatase TiO2 Thin Films Grown by Facing-Target Reactive Sputtering and Its Impact on Photocatalytic Activity,”
Proceedings of International Symposium of Dry Process 2015, pp.125--126, Nov. 2015, Awaji Japan.

 

Yoshitaka Nakano, Retsuo Kawakami, Masahito Niibe, Tatsuo Shirahama and Takashi Mukai :
“A Relation between Pinch-Off Voltages and Deep-Level Defects in AlGaN/GaN Hetero-Structures Treated by CF4 Plasma,”
11th International Conference on Nitride Semiconductors (ICNS-11), Beijing, Sep. 2015.

 

Masahito Niibe and Takashi Tokushima:

”Low energy soft X-ray Emission Spectrometer at BL-09A in NewSUBARU”

The 12th inter’l conf. on Synchrotron Radiation Instrumentation (SRI2015) 6-10 July 2015, New York, USA.

 

Takumi Yonemura, Junji Iihara, Shigeaki Uemura, Koji Yamaguchi, Masahito Niibe:

”Development of the Surface-sensitive Soft X-ray Absorption Fine Structure Measurement Technique for the Bulk Insulator”

The 12th inter’l conf. on Synchrotron Radiation Instrumentation (SRI2015) 6-10 July 2015, New York, USA.

 

Retsuo Kawakami, Masahito Niibe, Yoshitaka Nakano and Takashi Mukai :
“Comparison between Surface Characteristics of Titanium Oxide Thin Films Treated with N2 Dielectric Barrier Discharge Plasma and Annealed in N2 Gas,”
Proc. 13th International Symposium of Sputtering & Plasma Processes (ISSP), pp.63--66, Kyoto, Jul. 2015.

 

Yoshitaka Nakano, Miao-Gen Chen, Daisuke Ogawa, Keiji Nakamura, Retsuo Kawakami, Masahito Niibe:

"Generation Behavior of Deep-Level Defects in Ar+-Irradiated GaN"

7th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials (ISPlasma2015) 26-31, March 2015, Nagoya, Japan.

 

ƒ‚Q‚O‚P‚S”N„

  1. Masahito Niibe, Takuya Kotaka, Retsuo Kawakami, Yoshitaka Nakano and Takashi Mukai: 
  2. ”Etching damage analysis of n-GaN crystals etched with N2-plasma using soft X-ray absorption spectroscopy”

36th International Symposium on Dry Process (DSP2014), Nov. 27-28 (2014) Yokohama, Japan.

 

  1. R. Kawakami, M. Niibe, Y. Nakano, T. Shirahama, S. Hirai and T. Mukai:
  2. ”Morphological and Compositional Changes in AlGaN Surfaces etched by RF Capacitively Coupled  Carbon Tetrafluoride and Argon Plasmas”

36th International Symposium on Dry Process (DSP2014), Nov. 27-28 (2014) Yokohama, Japan.

 

  1. Keiji Sano, Masahito Niibe, Retsuo Kawakami, Yoshitaka Nakano:

”Spectral Recovery of Etching Damage of TiO2 thin film Observed in XAS Spectra”
7th International Symposium on Surface Science (ISSS-7), Nov. 2-6 (2014) Matsue, Japan.

 

  1. Shodai Hirai, Masahito Niibe, Retsuo Kawakami, Yoshitaka Nakano:

”Surface analysis of AlGaN treated by Ar and CF4 plasma etching”
7th International Symposium on Surface Science (ISSS-7), Nov. 2-6 (2014) Matsue, Japan.

 

Masahito Niibe, Takuya Kotaka, Retsuo Kawakami, Yoshitaka Nakano and Takashi Mukai:

”Damage Characteristics of n-GaNCrystal Etched with N2 Plasma by Soft X-ray Absorption Spectroscopy”
7th International Symposium on Surface Science (ISSS-7), Nov. 2-6 (2014) Matsue, Japan.

 

  1. R.Tamura, A.Tsukagoshi, S.Honda, M.Niibe, M.Terasawa, R.Hirase, H.Yoshioka, H.Izumi, K.Niwase, E.Taguchi, K.-Y.Lee, and M.Oura:

“Surface Modification on Horizontally Aligned Multi-walled Carbon Nanotube Films by Ar Ion Irradiation”
The 15th IUMRS-International Conference in Asia (IUMRS-ICA 2014), Fukuoka, Japan, August 24-30, 2014.

 

ƒ‚Q‚O‚P3”N„

  1. Masahito Niibe, Takuya Kotaka, Satoshi Jinguji, Shozo Inoue:

“Evaluation of BN Thin Film Deposited on Cemented Carbide using Soft X-ray Absorption Spectroscopy”
15th International Conference on Toral Reflection X-ray Fluorescence Analysis and Related Methods (TXRF 2013), Sep. 23-27 (2013) Osaka, Japan.

 

  1. Masahito Niibe, Keiji Sano, Retsuo Kawakami, Yoshitaka Nakano:

”Recovery of disordered spectra of Ti-L NEXAFS in dry-etched TiO2 thin film by UV irradiation”
15th International Conference on Toral Reflection X-ray Fluorescence Analysis and Related Methods (TXRF 2013), Sep. 23-27 (2013) Osaka, Japan.

 

  1. Masahito Niibe, Keiji Sano, Takuya Kotaka, Retsuo Kawakami, Kikuo Tomonaga, Yoshitaka Nakano:

“Etching Damage and Its Recovery by Soft X-ray Irradiation Observed in Soft X-ray Absorption Spectra of TiO2 Thin Film”
38th International conference on Vacuum Ultraviolet and X-ray Physics, July 12-19 (2013), Hefei, China.

 

  1. Masahito Niibe, Takuya Kotaka, Satoshi Jinguji, Shozo Inoue:

“Characterization of BN Thin Film Deposited on Cemented Carbide Using Near Edge X-ray Absorption Fine Structure Spectroscopy”
38th International conference on Vacuum Ultraviolet and X-ray Physics, July 12-19 (2013), Hefei, China.

 

  1. R. Kawakami, M. Niibe, H. Takeuchi, T. Shirahama, M. Konishi, Y. Mori, T. Yamada. K. Tominaga:

“Damage characteristics of 6H-SiC surface etched using capacitively-coupled helium plasmas driven by a radio frequency power”
12th International symposium on Sputtering and Plasma Processes, July 10-12 (2013), Kyoto, Japan.

 

  1. Y. Nakano, K. Nakamura, M. Niibe, R. Kawakami, N. Ito, T. Kotaka, K. Tominaga:

”Effect of UV Irradiation on Ar-Plasma Etching Characteristics of GaN”
5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, January 28-February1 (2013), Nagoya, Japan.

 

  1. Y Nakano, M. Niibe, M. Lozac’h, L. Sang, M. Sumiya:

”Deep level investigation of thick InGaN films”
5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, January 28-February1 (2013), Nagoya, Japan.

 

ƒ‚Q‚O‚P‚Q”N„

  1. S. Honda, Y. Nosho, A. Tsukagoshi, H. Okada, M. Niibe, M. Terasawa, R. Hirase, H. Yoshioka, H. Izumi, K. Niwase, E. Taguchi, K.-Y. Lee and M. Oura:

”Change of Diameters of Multi-walled Carbon Nanotubes by Multiply Charged Ar Ion Irradiation”
25th International Conf. on Atomic Collisions in Solids, Oct. 21-25 (2012), Kyoto, Japan.

 

  1. S. Honda, Y. Nosho, A. Tsukagoshi, S. Miyamoto, M. Niibe, M. Terasawa, T. Tokushima, Y. Horikawa, R. Hirase, H. Yoshioka, H. Izumi, K. Niwase, E. Taguchi, K.-Y. Lee and M. Oura:

”Analysis of the C1s X-ray Photoelectron Spectrum and C Kα X-ray Emission Spectrum of Multi-walled Carbon Nanotubes Irradiated by Multiply Charged Ar Ion”
25th International Conf. on Atomic Collisions in Solids, Oct. 21-25 (2012), Kyoto, Japan.

 

  1. R. Kawakami, M. Niibe, H. Takeuchi, M. Konishi, Y. Mori, T. Shirahama, T. Yamada K. Tominaga:

”SiC Surface Damage Originating from Synergy Effect of Ar Plasma Ion and Plasma-Induced Ultraviolet Light Irradiations”

25th International Conf. on Atomic Collisions in Solids, Oct. 21-25 (2012), Kyoto, Japan.

 

  1. A. Tsukagoshi, R. Osugi, H. Okada, S. Honda, M. Niibe, M. Terasawa, R. Hirase, H. Yoshioka, H. Izumi, K. Niwase, E. Taguchi, K.-Y. Lee and M. Oura:

”Spectroscopic Characterization of Ion-irradiated Multi-layer Graphenes”
25th International Conf. on Atomic Collisions in Solids, Oct. 21-25 (2012), Kyoto, Japan.

 

  1. S. Honda, Y. Nosho, A. Tsukagoshi, R. Mukouda, M. Niibe, M. Terasawa, R. Hirase, H. Yoshioka, H. Izumi, K. Niwase, E. Taguchi, K.-Y. Lee and M. Oura:
  2. ”Raman and X-ray Absorption Spectroscopic Study on Defects in Vartically Aligned Multi-walled Carbon Nanotubes irradiated with Ar Ions”

25th International Conf. on Atomic Collisions in Solids, Oct. 21-25 (2012), Kyoto, Japan.

 

  1. M. Niibe, T. Kotaka, K. Sano, R. Kawakami, K. Tominaga, Y. Nakano:

”Etching Damage Analysis of TiO2 Thin Film with Soft X-ray Absorption Spectroscpy”
25th International Conf. on Atomic Collisions in Solids, Oct. 21-25 (2012), Kyoto, Japan.

 

  1. Y. Nakano, K. Nakamura, M. Niibe, R. Kawakami, N. Ito, T. Kotaka, K. Tominaga:

”Effect of UV irradiation on Ar-plasma etching of GaN”
International Workshop on Nitride Semiconductors 2012, October 14-19 (2012), Sapporo, Japan.

 

  1. S.Honda, Y.Nosho, A.Tsukagoshi, S.Miyamoto, M.Niibe, M.Terasawa, T.Tokushima, Y.Horikawa, R.Hirase, H.Yoshioka, H.Izumi, K.Niwase, E.Taguchi, K,-Y.Lee, and M.Oura:

“Electronic Structure of Multi-walled Carbon Nanotubes Irradiated by Multiply Charged Ar Ions”
12th International Conference on Electronic Spectroscopy and Structure (ICESS 2012), Sait-Malo, France, September 16-21, 2012.

 

  1. M. Niibe, T. Kotaka, T. Mitamura:

”Investigation of analyzing depth of N-K absorption spectra measured by TEY and TFY metthods.
11th Int’l. Conf. on Syncrotron Rad. Instrum., 9-13 July (2012), Lyon, France.

 

  1. M. Niibe, K. Koida, Y. Kakutani:

”Contamination Experiment for Mo/Si Multilayer Mirrors with the use of Single-bunch Synchrotron Radiation”,  

11th Int’l. Conf. on Syncrotron Rad. Instrum., 9-13 July (2012), Lyon, France.

 

  1. K. Kanda, T. Hasegawa, M. Uemura, M. Niibe, Y. Haruyama, M. Motoyama, K. Amemiya, S. Fukushima, T. Ohta: 
  2. ”Construction of a Wide-rande High-resolution Beamline BL05 in NewSUBARU for Soft X-ray Spectroscopic Analysis on Industrial Materials.”

11th Int’l. Conf. on Syncrotron Rad. Instrum., 9-13 July (2012), Lyon, France.

 

  3. M. Niibe, T. Kotaka, R. Kawakami, Y. Nakano, T. Inaoka, K. Tominaga, and T. Mukai:

”Damage analysis of n-GaN crystals etched with He and N2 plasma”

4th Int’l. Symposium on Advanced Plasma Sci. and its Applications, Nagoya, Japan 4-8 March (2012).

 

ƒ‚Q‚O‚P‚P”N„

  1. Y. Nakano, R. Kawakami, M. Niibe, A. Takeichi, T. Inaoka, K. Tominaga

”Photoluminescence Study of Plasma-Induced Etching Damages in GaN”
Materials Research Society 2011 Fall Meeting, 28 Nov-2Dec (2011), Boston, USA

 

  1. R. Kawakami, M. Niibe, A. Takeichi, Y. Mori, M. Konishi, T. Kotaka, F. Matsunaga, T. Takasaki, T. Kitano, T. Miyazaki, T. Inaoka, and K. Tominaga: ”Characteristics of TiO2 Thin Film Surfaces Treated by Dielectric Barrier Discharge Helium and Air Plasmas”

Internat. Symp. of Dry Process 2011 (2011, Kyoto) pp. 75-76, ISBN: 978-4-86348-216-6.

 

  1. Masahito Niibe, Takuya Kotaka, Satoko Hori, Shozo Inoue:

”Characterization of Crystalline Structure of BN Thin Film Using Soft X-ray Absorption Spectroscaopy”
15th International Conf. Thin Films (ICTF-15), 8~11 Nov. 2011, Kyoto, Japan.

 

  1. A. Fujimoto, M. Okada, Y. Kang, M. Niibe, S. Matsui, T. Suzuki, and K. Kanda:

”Thermal Durability of FIB-DLC Films containing W”,

24th Internat. Microprocesses and Nanotechnology Conf. (MNC2011), ANA Hotel Kyoto, Oct. 24-27, [27P-11-28].

 

  1. S. Honda, Honda, S. Nanba, Y. Hasegawa, M. Niibe, and M. Terasawa, R. Hirase, H. Yoshioka, H. Izumi, K.-Y. Lee:
  2. ”Raman spectroscopy and X-ray absorption near-edge structure study of defects in vertically aligned multi-walled carbon nanotube films introduced by Ar ion irradiation” 22nd European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, and Nitrides, 7 September, 2011, Bavaria, Germany

 

  1. M. Sakamoto, F. Tsumuraya, M. Niibe:
  2. ”A Development plan of sputtering system for large scale telescope mirror coating at Nish-Harima astronomical observatory”

11th Internattional Symp. Sputtering & Plasma Processes (ISSP2011), 6~8 July 2011 Kyoto, Japan.

 

  1. S. Hori, K. Fujii, M. Niibe, K. Yoshiki, T. Namazu, S. Inoue: 
  2. ”Effect of substrate temperature and bias voltage on the crystalline structure of BN films prepared by rf magnetron sputtering”

11th Internattional Symp. Sputtering & Plasma Processes (ISSP2011), 6~8 July 2011 Kyoto, Japan.

 

  1. T. Kotaka, M. Niibe, R. Kawakami, T. Inaoka, K. Tominaga, T. Muaki:

”Damage analysis of gallium nitride crystals etched by He and Ar plasmas”
11th Internattional Symp. Sputtering & Plasma Processes (ISSP2011), 6~8 July 2011 Kyoto, Japan.

 

  1. R. Kawakami, A. Takeichi, M. Niibe, M. Konishi, Y. Mori, M. Kodama, T. Kotaka, T. Inaoka, K. Tominaga:

”Capacitively coupled radio frequency helium plasma treatment effect on TiO2 thin film surfaces”
11th Internattional Symp. Sputtering & Plasma Processes (ISSP2011), 6~8 July 2011 Kyoto, Japan.

 

  1. A. Takeichi, R. Kawakami, M. Niibe, M. Konishi, Y. Mori, M. Kodama, T. Kotaka, T. Inaoka, K. Tominaga:

”Capacitively coupled radio frequency nitrogen plasma etch damage to n-type gallium nitride”
11th Internattional Symp. Sputtering & Plasma Processes (ISSP2011), 6~8 July 2011 Kyoto, Japan.

 

  1. Kazuhiro Kanda, Masahito Niibe, Masahito Tagawa, Kumiko Yokota:

“Reaction Mechanism of the Irradiation of Soft X-ray to the Diamond-Like Carbon Films”
10th International Space Conference on Protection of Materials and Structures from the Space Environment (ICPMSE-10J), Bankokushinryoukann, Nago, June 12-17, 2011 [C-8].

 

  1. Kazuhiro Kanda, Masahito Niibe, Akira Wada, Haruhiko Itoh, Tsuneo Suzuki, and Hidetoshi Saitoh:

“Near-Edge X-ray Absorption Fine Structure Spectra of Si-containing DLC Thin Films”
5th International Conference on New Diamond and Nano Carbons(NDNC2011)Kunibiki Messe, Matsue, May 16-20, 2011, [16-5]

 

  1. M. Niibe, T. Kotaka, R. Kawakami, T. Inaoka, K. Tominaga, and T. Mukai:

”Damage Analysis of Plasma-etched n-GaN Crystal Surface by Nitrogen K-edge NEXAFS Spectroscopy”
3ed Int’l. Symposium on Advanced Plasma Sci. and its Applications, Nagoya, Japan 6-9 March (2011).

 

ƒ‚Q‚O‚P‚O”N„

  1. M. Niibe, K. Koida, T. Nakayama, S. Terashima, A. Miyake, H. Kubo, Y. Kakutani, S. Matsunari, T. Aoki, S. Kawata,: ”Nonlinear Behavior of Carbon Deposition on the Projection Optics Mirrors by EUV Irradiation in the Coexistence of Hydrocarbon Gas and Water Vapor”,

23ed Int’l. Microprocesses and Nanotechnology Conference, 9-12 Nov. 2010 Kokura, Japan.

 

  1. A. Wada, T. Suzuki, M. Niibe, H. Ito, K. Kanda:

”Annealing Effect of W  Incorporated DLC favricated by Ga focus ion beam CVD”,
23ed Int’l. Microprocesses and Nanotechnology Conference, 9-12 Nov. 2010 Kokura, Japan.

 

  1. M. Niibe, K. Koida, Y. Kakutani, S. Matsunari, T. Aoki, S. Kawata, T. Nakayama, S. Terashima, A. Miyake, H. Kubo: ”Contamination experiment for EUVL optics mirrors with the use of single bunch SR”,

2010 Int’l Symp. Extreme Ultraviolet Lithography, 17-20 Oct. Kobe, Japan.

 

  1. M. Niibe, K. Koida, Y. Kakutani, T. Nakayama, S. Terashima, A. Miyake, H. Kubo, S. Matsunari, T. Aoki, S. Kawata,: ”Non-linearity of carbon deposition by EUV irradiation in the coexistence of hydrocarbon gas and water vapor”,

2010 Int’l Symp. Extreme Ultraviolet Lithography, 17-20 Oct. Kobe, Japan.

 

M. Niibe, Y. Maeda, R. Kawakami, T. Inaoka, K. Tominaga, and T. Mukai:
"Surface analysis on n-GaN crystal damaged by RF-plasma-etching with Ar, Kr, and Xe gases"
37th Int'l. Symposium on Compound Semiconductors, Takamatsu Japan, May 31-June 4 (2010).

 

R. Kawakami, T. Inaoka, K. Tominaga, M. Niibe T. Mukai, A. Takeichi, and T. Fukudome:
"Etch-induced damage characteristics of n-GaN surfaces by capacitively coupled radio frequency He and Ar plasmas"
37th Int'l. Symposium on Compound Semiconductors, Takamatsu Japan, May 31-June 4 (2010).

 

ƒ‚Q‚O‚O‚X”N„

M. Niibe, K. Koida, T. Nakayama, S. Terashima, A. Miyake, H. Kubo, Y. Kakutani, S. Matsunari, T. Aoki, S. Kawata: "Inhibition of deposition and removal of carbon films on the multilayer surface by EUV irradiation in the presence of water vapor, oxygen and ozone gases"
2009 Int'l Symp. Extreme Ultraviolet Lithography, Prague, Czech Republic, Oct. 19-Oct. 21 (2009).

 

K. Kanda, M. Okada, Y. Kang, M. Niibe, S. Matsui:
"NEXAFS study of the annealing effect on the DLC films fabricated using Ga focused ion beam assisted deposition"
23rd Diamond Symposium (2009).

 

Masahito Niibe, Masanori Kayahara, and Shozo Inoue
"Electronic structure and photocatalytic activity of titania thin films prepared by magnetron sputtering with glancing angle deposition technique"
11th Int'l. Conf. Electron Spectroscopy and Structure, Nara, Japan, Oct. 6-10 (2009).

 

R. Kawakami, T. Inaoka, K. Tominaga, M. Niibe, T. Mukai, A. Takeichi and T. Fukudome:
"Synergy Effect of Xenon Plasma Ions and Ultraviolet Lights on GaN Etch Surface Damage and Modification", 16th International Conference on Surface Modification of Materials by Ion Beams (SMMIB2009), Tokyo, Japan, Sept. 13-18 (2009).

 

Masahito Niibe and Keigo Koida:
"Competitive reactions of carbon deposition and oxidation on the surface of Mo/Si multilayer mirrors by EUV irradiation.
SPIE Europe 2009, Prague, Czech Republic, 20-23 Apr. (2009).

 

T. Nakayama, H. Takase, S. Terashima, T. Sudo, Y. Watanabe, Y. Fukuda, K. Murakami, S. Kawata, T. Aoki, S. Matsunari, Y. Kakutani, M. Niibe, K. Koida: "Analysis of deposition on multilayer mirrors using two different beam lines",
SPIE 34th International Symposium Microlithography, 22-27 Feb-2009 San Jose, USA.

 

S. Matsunari, Y. Kakutani, T. Aoki, K. Murakami, S. Kawata, T. Nakayama, S. Terashima, H. Takase, Y. Watanabe, Y. Gomei, Y. Fukuda, M. Niibe: "Durability of capped multilayer mirror for high-volume manufacturing extreme-ultraviolet lithograph tool",
SPIE 34th International Symposium Microlithography, 22-27 Feb-2009 San Jose, USA.

 

ƒ‚Q‚O‚O‚W”N„

Keigo Koida and Masahito Niibe:
"Study on contamination of projection optics surface for extreme ultraviolet lithography"
4th Vac. & Surf. Sci. Conf. Asia and Australia, Matsue Japan, Oct. 28-31 (2008).

 

M. Tagawa, K. Yokota, A. Kitamura, K. Matsumoto, A. Yoshogoe, Y. Terada, K. Kanda, M. Niibe: "Selective Etching of sp2 Carbon in a Diamond-like Carbon Film by Hyperthermal Atomic Oxygen Exposures"
4th Vac. & Surf. Sci. Conf. Asia and Australia, Matsue Japan, Oct. 28-31 (2008).

 

M. Niibe and K. Koida: "Experiment of Contamination Generation by EUV irradiation with the Use of High-Mass Hydrocarbon Gas",
2008 Int'l Symp. Extreme Ultraviolet Lithography, Lake Tahoe, USA, Sept. 28-Oct. 1 (2008).

 

Y. Fukuda, H. Takase, S. Terashima, Y. Watanabe, T. Nakayama, Y. Gomei, T. Aoki, S. Tatsunari. S. Kawata, Y. Kakutani, K. Koida, M. Niibe: "Contamination Study at EUVA",
2008 Int'l Symp. Extreme Ultraviolet Lithography, Lake Tahoe, USA, Sept. 28-Oct. 1 (2008).

 

T. Aoki, Y. Kakutani, S. Matsunari, K. Murakami, S. Kawata, T. Nakayama, S. Terashima, H. Takase, Y. Watanabe, Y. Gomei, Y. Fukuda, M. Niibe: "Durability of Capped Multilayer Mirrors for Extreme Ultraviolet Lithography Tool",
2008 Int'l Symp. Extreme Ultraviolet Lithography, Lake Tahoe, USA, Sept. 28-Oct. 1 (2008).

 

M. Niibe, K. Miyamoto and K. Mochiji,
"Identification of B-K XANES Peaks of BN Thin Film Prepared by Sputtering Deposition",
5th Int'l. Workshop on DV-Xα, Himeji, Japan, Aug. 6-8 (2008)

 

M. Niibe, K. Koida and Y. Kakutani: "Protection and reduction of surface oxidation of Mo/Si multilayers for extreme ultraviolet lithography projection optics by control of hydrocarbon gas atmosphere",
52nd Int'l Conf. Electron, Ion and Photon Beam Technol. May-28-30, 2008 Portland, USA.

 

K. Koida, M. Niibe, Y. Kakutani, S. Matsunari, T. Aoki, S. Terashima, T. Nakayama, H. Takase, Y. Fukuda:
"Reduction of surface oxide layer of projection optics mirrors by EUV irradiation in presence of ethanol"
SPIE Advanced Lithography Conf., Feb. 24-29 2008, San Jose, USA.

 

T. Nakayama, H. Takase, S. Terashima, Y. Watanabe, T. Sudou, Y. Fukuda, T. Aoki, S. Matsunari, K. Murakami, S. Kawata, Y. Kakutani, M. Niibe:
"Characteristics of additional carbon on the surface of carbon capping layer"
SPIE Advanced Lithography Conf., Feb. 24-29 2008, San Jose, USA.

 

K. Sugisaki, M. Okada, K. Ohtaki, Y. Zhu, Z. Liu, J. Kawakami, K. Murakami, C. Ouchi, M. Hasegawa, S. Kato, T. Hasegawa, H. Yokota, T. Honda, M. Niibe:
"EUV wavefront measurement of six-mirror optics using EWMS"
SPIE Advanced Lithography Conf., Feb. 24-29 2008, San Jose, USA.

 

ƒ‚Q‚O‚O‚V”N„

N. Yamada, K. Kanda, K. Yokota, M. Tagawa, M. Niibe, Y. Haruyama S. Matsui:
"Surface modification of a diamond-like carbon thin film using hyperthermal fluorine beam"
Micro and Nanoprocess Conference 2007, 28-Oct-2007 Kyoto Japan.

 

H. Takase, S. Terashima, Y. Watanabe, T. Nakayama, T. Sudou, Y. Fukuda, T. Aoki, S. Matsunari, K. Murakami, S. Kawata, Y. Kakutani, M. Niibe:
"Characteristics of additional carbon on the surface of carbon capping layer"
2007 Int'l Extreme Ultraviolet Lithography Symposium, Oct. 29-31, 2007, Sapporo, Japan.

 

K. Koida, M. Niibe, Y. Kakutani, S. Matsunari, T. Aoki, H. Takase, S. Terashima, Y. Gomei, K. Murakami Y. Fukuda:
"Reduction of surface oxide layer of projection optics mirrors by EUV irradiation in presence of ethanol"
2007 Int'l Extreme Ultraviolet Lithography Symposium, Oct. 29-31, 2007, Sapporo, Japan.

 

K. Murakami, K. Sugisaki, M. Okada, K. Ohtaki, Y. Zhu, Z. Liu, J. Saito, C. Ouchi, S. Kato, M. Hasegawa, T. Hasegawa, H. Yokota, T. Honda, M. Niibe, M. Takeda:
"Development status of EUV wavefront metrology system (EWMS)"
2007 Int'l Extreme Ultraviolet Lithography Symposium, Oct. 29-31, 2007, Sapporo, Japan.

 

Masahito Niibe, Keigo Koida and Yukinobu Kakutani:
"In situ XAS Analysis for EUV Projection Optics Contamination"
19th Int'l Congress on X-Ray Optics and Microanalysis (ICXOM 2007), Sep. 16-21, 2007, Kyoto, Japan

 

M. Niibe, Y. Kakutani, K. Koida, S. Matsunari, T. Aoki, S. Terashima, H. Takase, K. Murakami, Y. Fukuda: "In situ XANES Analysis for EUVL Projection Optics Contamination",
51st Int'l Conf. Electron, Ion and Photon Beam Technol. May-29- June-1, 2007 Denver, USA.

 

Y. Kakutani, M. Niibe, Y. Gomei, Terashima, H. Takase, S. S. Matsunari, T. Aoki, and Y. Fukuda: "Long-term durability of a Ru capping layer for EUVL projection optics by introducing ethanol",
SPIE 32nd International Symposium Microlithography, 27-Feb-2007 San Jose, USA.

 

S. Matsunari, T. Aoki, K. Murakami, Y. Gomei, S. Terashima, H. Takase, M. Tanabe, Y. Kakutani, M. Niibe, Y. Fukuda: "Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation",
SPIE 32nd International Symposium Microlithography, 27-Feb-2007 San Jose, USA.

 

ƒ‚Q‚O‚O‚U”N„

T. Aoki, S. Matsunari, K. Murakami, S. Terashima, H. Takase, Y. Watanabe, Y. Gomei, Y. Kakutani, M. Niibe, Y. Fukuda: "Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation",
2006 International EUVL Symposium, 15-18 Oct.2006, Barcelona, Spain.

 

K. Murakami, K. Sugisaki, M. Okada, K. Ohtaki, Y. Zhu, Z. Liu, J. Saito, C. Ouchi, S. Kato, M. Hasegawa, T. Hasegawa, H. Yokota, M. Niibe and M. Takeda:
"Development of EUV wavefront metrology system (EWMS)",
2006 International EUVL Symposium, 15-18 Oct.2006, Barcelona, Spain.

 

Y. Kakutani, M. Niibe, Y. Gomei, S. Terashima, H. Takase, Y. Watanabe, T. Aoki, S. Matsunari, K. Murakami, Y. Fukuda: "High Acceleration Test for Contamination of Ru Capping Layers for EUVL Projection Optics Mirrors",
2006 International EUVL Symposium, 15-18 Oct.2006, Barcelona, Spain.

 

M. Niibe, Y. Kakutani, S. Matsunari, T. Aoki, S. Terashima, H. Takase, Y. Gomei, K. Murakami, Y. Fukuda: "In situ XANES Analysis for EUVL Projection Optics Contamination",
2006 International EUVL Symposium, 15-18 Oct.2006, Barcelona, Spain.

 

Y. Kakutani, M. Niibe, Y. Gomei, H. Takase, S. Terashima, S. Matsunari, T. Aoki, K. Murakami, Y. Fukuda: "Inhibition of Contamination of Ru-Capped Multilayers Mirrors for EUVL Projection Optics by Ethanol",
MNC2006 International EUVL Symposium, 25-27 Oct.2006, Kamakura, Japan.

 

M, Niibe, K. Sugisaki, M. Okada, S. Kato, C. Ouchi, M. Hasegawa:
"Wavefront Metrology for EUV Projection Optics by Soft X-ray interferometry in the NewSUBARU",
SRI2006, 28 May – 2 June Daegu, Korea.

 

Y. Kakutani, M. Niibe, H. Takase, S. Terashima, M. Tanabe, Y. Watanabe, Y. Gomei, S. Matsunari, T. Aoki, K. Murakami, Y. Fukuda: "Experimental System for Contamination study developed at NewSUBARU",
SRI2006, 28 May – 2 June Daegu, Korea.

 

Y. Kakutani, M. Niibe, Y. Gomei, H. Takase, S. Terashima, M. Tanabe, Y. Watanabe, S. Matsunari, T. Aoki, K. Murakami, Y. Fukuda:
"Dependence of EUV irradiation power on a damage of Ru-capping layer for projection optics",
NGL Workshop 2006, 6 – 7 July Tokyo, Japan.

 

H. Takase, S. Terashima, Y. Watanabe, M. Tanabe, Y. Fukuda, Y. Gomei, S. Matsunari, T. Aoki, K. Murakami, Y. Kakutani, M. Niibe: "Study of Ru capped multilayer mirror for EUV irradiation durability",
NGL Workshop 2006, 6 – 7 July Tokyo, Japan.

 

S. Matsunari, T. Aoki, K. Murakami, M. Tanabe, S. Terashima, H. Takase, Y. Watanabe, Y. Fukuda, Y. Gomei, Y. Kakutani, M. Niibe: "Carbon deposition on Si-capped multi-layer mirrors by extreme ultra violet ray irradiation",
NGL Workshop 2006, 6 – 7 July Tokyo, Japan.

 

M. Hasegawa, S. Kato, C. Ouchi, A. Suzuki, H. Yokota, K. Sugisaki, M. Okada, K. Otaki, K. Murakami, J. Saito, M. Niibe, M. Takeda:
"Absolute Wavefront Evaluation of EUV Projection Optics at EUVA"
EIPBN 2005, 2-Jun-2006, Orlando, Florida, USA.

 

K. Sugisaki, M. Okada, K. Otaki, Y. Zhu, Z. Liu, J. Saito, K. Murakami, M. Hasegawa, C. Ouchi, S. Kato, A. Suzuki, M. Niibe
"Systematic error evaluations of at-wavelength wavefront metrology with Experimental EUV Interferometer,"
EIPBN 2005, 2-Jun-2006, Orlando, Florida, USA.

 

Y. Kakutani, M. Niibe, H. Takase, S. Terashima, H. Kondo, S. Matsunari, T. Aoki, Y. Gomei, Y. Fukuda:
"Lifetime Improvement of Projection Mirror with Ru Capping Layer for EUVL by Irradiation Atmosphere",
4th Int'l. symp. on EUVL, Nov. 7-9, 2005, San Diego, USA 3-CC-15.

 

M. Niibe, Y. Kakutani, S. Terashima, H. Takase, Y. Gomei, H. Kondo, S. Matsunari, T. Aoki, Y. Fukuda:
"A New Contamination Evaluation System for EUVL Projection Mirrors in NewSUBARU",
4th Int'l. symp. on EUVL, Nov. 7-9, 2005, San Diego, USA 1-CC-02.

 

M. Okada, K. Sugisaki, K. Otaki, Y. Zhu, Z. Liu, J. Saito, K. Murakami, C. Ouchi, M. Hasegawa, S. Kato, T. Hasegawa, A. Suzuki, H. Yokota, M. Niibe:
"Systematic Error Evaluation of EUV Wavefront Metrology System",
4th Int'l. symp. on EUVL, Nov. 7-9, 2005, San Diego, USA 1-ME-02.

 

T. Hasegawa, C. Ouchi1, M. Hasegawa, S. Kato, A. Ohkubo, H. Yokota, Y. Tanaka, K. Murakami, J. Saito, J. Kawakami, K. Sugisaki, M. Okada, Y. Zhu, K. Otaki, Z. Liu, M. Niibe
"EUV Wavefront Metrology System in EUVA"
4th Int'l EUVL Symposium, 7-Nov-05, San Diego, USA !-ME-05.

 

Y. Kakutani, M. Niibe, H. Takase, S. Terashima, Y. Gomei, S. Matsunari, T. Aoki, K. Murakami, Y. Fukuda: "Suppression of Reflectance Drop of Ru-Capped Multilayer Mirror by Irradiation Atmosphere",
MNC2005 Conference, Oct. 26-28, 2005, Tokyo Japan 27A-6-5.

 

M. Niibe, Y. Kakutani, S. Terashima, H. Takase, Y. Gomei, S. Matsunari, T. Aoki, K. Murakami, Y. Fukuda: "A New EUV Irradiation and Multilayer Evaluation System for EUVL Mirror Contamination in NewSUBARU",
MNC2005 Conference, Oct. 26-28, 2005, Tokyo Japan 27P-7-3.

 

K. Sugisaki, M. Okada, Y. Zhu, K. Otaki, Z. Liu, J. Kawakami, M. Ishii, J. Saito, K. Murakami, M. Hasegawa, C. Ouchi, S. Kato, T. Hasegawa, A. Suzuki, M. Takeda, M. Niibe,
"Comparisons between EUV at-wavelength metrological methods,"
Optics & Photonics conference, 02-Aug-2005, San Diego, California, USA.

 

K. Sugisaki, M. Hasegawa, M. Okada, Y. Zhu, K. Otaki, Z. Liu, M. Ishii, J. Kawakami, K. Murakami, J. Saito, S. Kato, C. Ouchi, A. Ohkubo, Y. Sekine, T. Hasegawa, A. Suzuki, M. Niibe, M. Takeda.
"EUVA's challenges toward 0.1 nm accuracy in EUV at-wavelength interferometry,"
The 5th International Workshop on Automatic Processing of Fringe Patterns (Fringe 2005), 13-Sep-2005, Stuttgart, Germany

 

S. Kato, C. Ouchi, M, Hasegawa, T. Hasegawa, H, Yokota, K. Sugisaki, M. Okada, K. Murakami, J. Saito, M, Niibe, M. Takeda, " EUV Wavefront Metrology System at EUVA,"
SPIE 31th International Symposium Microlithpgraphy, 20-Feb-2006, San Jose, USA.

 

K. Otaki, M. Okada, K. Sugisaki, Y. Zhu, Z. Liu, J. Saito, K. Murakami, S. Kato, C. Ouchi, M. Hasegawa, T. Hasegawa, A. Suzuki, H. Yokota, M. Niibe, M. Takeda,
"Accuracy evaluation of@the wavefront metrology tool for EUVL projection optics,"
SPIE 31th International Symposium Microlithpgraphy, 23-Feb-2006,San Jose, USA.

 

ƒ‚Q‚O‚O‚T”N„

K. Otaki, K. Sugisaki, M. Okada, Y. Zhu, Z. Liu, J. Saito, K. Murakami, C. Ouchi, M. Hasegawa, S. Kato, T. Hasegawa, A. Suzuki, M. Niibe,:
"Accuracy Evaluation of the X-ray interferometer for EUVL optics",
8th Int'l. Conference on X-ray Microscopy., 26-30, July-2005, Himeji, Japan P48.

 

Y. Kakutani, M. Niibe, H. Takase, S. Terashima, H. Kondo, S. Matsunari, T. Aoki, Y. Gomei, Y. Fukuda:
"Reflectance change of Si- and Ru-capped Mo/Si multilayer mirrors caused by intense EUV irradiation",
SPIE 30th Int'l symp. Microlithography, 28-Feb-2005.

 

H. Takase, Y. Gomei, S. Terashima, H. Kondo, T. Aoki, S. Matsunari, M. Niibe, Y. Kakutani:
"Characterization of capped multilayer mirrors using XPS, AES and SIMS",
SPIE 30th Int'l symp. Microlithography, 28-Feb-2005.

 

S. Kato, C. Ouchi, M. Hasegawa, A. Ohkubo, A. Suzuki, K. Murakami, J. Saito, K. Sugisaki, M. Okada, M. Niibe:
"Comparison of EUV interferometry methods in EUVA project",
SPIE 30th Int'l symp. Microlithography, 28-Feb-2005.

 

Z. Liu, M. Okada, K. Sugisaki, M. Ishii, Y. Zhu, J. Saito, K. Murakami, A. Suzuki, M. Hasegawa, C. Ouchi, S. Kato, M. Niibe,:
"Double-grating shearing interferometer for EUV optics at-wavelength measurement",
SPIE 30th Int'l symp. Microlithography, 28-Feb-2005.

 

ƒ‚Q‚O‚O‚S”N„

M. Niibe, Y. Kakutani, S. Terashima, H. Takase, Y. Gomei, T. Aoki, S. Matsunari, H. Kondo, Y. Fukuda:
"Experiment of EUV Mirror Contamination with use of Undulator Radiation",
Micro and Nanoprocess Conference 2004, 28-Oct-2004.

 

C. Ouchi, M. Hasegawa, S. Kato, A. Suzuki, K. Sugisaki, M. Okada, K. Murakami, J. Saito, M. Niibe, M. Takeda:
"Advances of EUV interferometry in EUVA",
Micro and Nanoprocess Conference 2004, 28-Oct-2004, Osaka Japan.

 

Y. Kakutani, M. Niibe, H. Takase, S. Terashima, H. Kondo, S. Matsunari, T. Aoki, Y. Gomei, Y. Fukuda:
"Measurement of reflectance drop by contaminations on multilayer mirrors at NewSUBARU",
3rd EUVL Int'l symp., 3-Nov-2004, CoP18.

 

H. Takase, Y. Gomei, S. Terashima, H. Kondo, T. Aoki, S. Matsunari, M. Niibe, Y. Kakutani:
"Characterization of capped multilayer mirrors using XPS, AES and SIMS",
3rd EUVL Int'l symp., 3-Nov-2004, CoP19.

 

K. Otaki, K. Sugisaki, M. Okada, M. Ishii, Y. Zhu, Z. Liu, J. K. Murakami, C. Ouchi, M. Hasegawa, S. Kato, T. Hasegawa, A. Suzuki, M. Niibe,:
"Accuracy Evaluation of Wavefront Metrology for High N.A.",
3rd EUVL Int'l symp., 3-Nov-2004, Me05.

 

S. Kato, C. Ouchi, M. Hasegawa, A. Ohkubo, Y. Sekine, A. Suzuki, T. Hasegawa, Y. Tanaka, K. Murakami, J. Saito, M. Ishii, J. Kawakami, K. Sugisaki, M. Okada, Y. Zhu, K. Otaki, Z. Liu, M. Niibe, M. Takeda:
"Application of Cross-grating Interferometer for EUV Wavefront Measurement",
3rd EUVL Int'l symp., 3-Nov-2004, Me15.

 

Y. Zhu, K. Sugisaki, M. Okada, K. Otaki, Z. Liu, M. Ishii, J. Kawakami, J. Saito, K. Murakami, C. Ouchi, M. Hasegawa, S. Kato, T. Hasegawa, A. Suzuki, M. Niibe,:
"Principle of Absolute Wavefront Measurement by a Point Diffraction Interferometer",
3rd EUVL Int'l symp., 3-Nov-2004, Me14.

 

M. Niibe, Y. Kakutani, K. Kakiuchi, T. Aoki, S. Matsunari, H. Kondo, S. Terashima, H. Takase, Y. Gomei, Y. Fukuda:
"Experiment of EUV Mirror Contamination with use of Undulator Radiation",
NGL Workshop 2004, 28-June-2004.

 

C. Ouchi, A. Suzuki, M. Hasegawa, Y. Sekine, Y. Tanaka, T. Hasegawa, S. Kato, S. Hara, Y. Kuramoto, K. Murakami, J. Saito, K. Ota, H. Kondo, M. Ishii, J. Kawakami, K. Sugisaki, Y. Zhu, K. Otaki, Z. Q. Lie, M. Niibe: "The experimental EUV Interferometer with several measurement methods",
NGL Workshop 2004, 28-June-2004.

 

Y. Shoji, A. Ando, S. Hashomoto, S. Hisao, T. Matsubara, S. Miyamoto, M. Niibe, T. Asaka, H. Ego, Y. Kawashima, H. Kitamura, N. Kumagai. H. Ohkuma, T. Ohshima, M. Oishi, S. Suzuki, M. Takao, T. Tanashima, T. Tannaka,
"NewSUBARU Storage Ring: Operational Progress in These Three Years"
3ed Asia Particle Accelerator Conf., Mar. 22-26, 2004, Gyeongju, Korea.

 

K. Sugisaki, M. Hasegawa, S. Kato, C. Ouchi, J. Saito, M. Niibe, A. Suzuki, K. Murakami:
"Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI"
SPIE 29th Annual Int'l Symp. Microlithography, Feb. 22-27 2004, Santa Clara, USA.

 

T. Hasegawa, C. Ouchi, M. Hasegawa S. Kato, K. Sugisaki, A. Suzuki, K. Murakami, J. Saito, M. Niibe:
"EUV wavefront metrology system in EUVA"
SPIE 29th Annual Int'l Symp. Microlithography, Feb. 22-27 2004, Santa Clara, USA.

 

Y. Zhu, K. Sugisaki, C. Ouchi, T. Hasegawa, M. Hasegawa, S. Kato, J. Saito, M. Niibe, A. Suzuki, K. Murakami:
"Lateral shearing interferometry for EUVL: theoretical analysis and at-experiment"
SPIE 29th Annual Int'l Symp. Microlithography, Feb. 22-27 2004, Santa Clara, USA.

 

ƒ‚Q‚O‚O‚R”N„

Y. Shoji, S. Miyamoto, M. Niibe, T. Tanaka, H. Kitamura:
"Magnetic Field Adjustment of 11 m Long Undulator"
The 14th Symp. on Accelerator Sci. and Technol., Tsukuba Japan, Nov. 11-13 (2003).

 

Y. Shoji, S. Miyamoto, M. Niibe, S. Hashimoto, and A. Ando:
"Beam Base Search for Linear Imperfection Fields in 11 m Long Undulator at NewSUBARU"
Proc. 14th Symp. on Accelerator Sci. and Technol. , Tsukuba Japan, Nov. 11-13 (2003).

 

C. Ouchi, A. Suzuki, M. Hasegawa, Y. Sekine, Y. Tanaka, T. Hasegawa, S. Kato, S. Hara, Y. Kuramoto, K. Murakami, J. Saito, K. Ota, H. Kondo, M. Ishii, J. Kawakami, K. Sugisaki, Y. Zhu, K. Otaki, Z. Q. Lie, M. Niibe: "The experimental EUV Interferometer with several measurement methods",
2nd Int'l. EUV Lithography Symp. 22 Nov. 2003 Antwerp, Belgium.

 

M. Niibe, M. Mukai, H. Kimura and Y. Shoji:
"Polarization Property Measurement of the Long Undulator Radiation Using Cr/C Multilayer Polarrization Elements"
8th Int'l Symp. on Synchrotron Radiation Instrumentation, San Francisco USA, Aug. 25-29 (2003).

 

Y. Shoji, S. Miyamoto, M. Niibe, S. Hahimoto and A. Ando:
"Beam Base Search for Linear Imperfection Fields in 11 m Long Undulator at NewSUBARU"
8th Int'l Symp. on Synchrotron Radiation Instrumentation, San Francisco USA, Aug. 25-29 (2003).

 

M. Niibe, M. Mukai, S. Miyamoto, Y. Shoji, S.Hahimoto, A. Ando, T. Tanaka, M. Miyai, and H. Kitamura:
"Characterization of Lght Radiated from 11 m Long Undulator"
8th Int'l Symp. on Synchrotron Radiation Instrumentation, San Francisco USA, Aug. 25-29 (2003).

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