Facility
Objective
Single layer and multilayer reflectivity and transmission can be measured by the monochromated SR light. Especially, this tool is international reflectometer to measure Mo/Si multilayer reflectivity and transmittance. In this system, since θ−2θ stages is employed, the reflectivity and the transmittance can be measured for various incidence angle. In addition, EUV resist transmittance can be measure to obtain optical constant of EUV resist materials.
Composition
Constant-deviation variable line and spacing plane grating is employed as the monochromator. And the bright monochromator with non aberration can be achieved. The bending magnet is employed as a light source of BL10 beamline.
Specification
Mirror Specification
Filter Specification
Just the upstream of the reflectometer, various filter can be installed in the filter chamber.
Specification of the Monochromator
Variable line and spacing plane grating: 600 /mm, 2400 /mm
Constant-deviation: 168 deg.
End station
At the end station, the relflectometer is installed. The reflectometer consists of θ−2θ stages, and the reflectivity and the transmittance can be measured for various incidence angle. The repeatability of the reflectivity and the centroid wavelength measurement are less than ±0.2% and ±0.01 nm, respectively.
Mo/Si多層膜の反射率測定例
