(97)　Saki Kondo, Yoshiaki Ukita, Kuniyo Fujihara, and Yuichi Utsumi, “Cross-linked Capillary Micromixer for High-sensitive Immunoassay ” 2008 International Microprocess and 　Nanotechnology Conference (MNC2008), pp90-91, Oct 27-30, 2008

(96)　Daisuke Fukuoka, and Yuichi Utsumi, “Micro Fluid Device of PMMA for DNA Sequence by Using  LIGA process and Fusion Bonding” International 　　　Conference on Electronics Packaging 2008 (ICEP2008), pp387-390, JAPAN, June 10-12, 2008.

(95)　Shigeaki Yamamoto, Takefumi Kishimoto, and Yuichi Utsumi, “Enhancement of the Adhesive Force of Metal films on PTFE Surface Achieved by Fast-Atom-Beam 　Surface Modification” International Coference on Electronics Packaging 2008 (ICEP2008), pp36-39, JAPAN, June 10-12, 2008.

(94)　Tsunemasa Saiki, Katsuhide Okada, and Yuichi Utsumi “PROPOSAL OF A MICRO LIQUID ROTOR OPERATED BY SURFACE-ACOUSTIC-WAVE” 　Twelfth International Conference on Miniaturized Systems for Chemistry and Life Sciences 2008 （μTAS2008）, October 12-16, 2008, San Diego, California, USA.

(93)　Yuichi Utsumi, Tsunemasa Saiki, and Katsuhide Okada “PROPOSAL OF A NOVEL CONTINUOUS FLOW PUMPING OPERATED BY SURFACE 　　　　ACOUSTIC WAVE”, Twelfth International Conference on Miniaturized Systems for Chemistry and Life Sciences 2008（μTAS2008）,  October 12-16, 2008, 　　San Diego, California, USＡ.

(92)　<<Keynote Speech>>Yuichi Utsumi “Development of 3D Micro Prototyping using Synchrotron Radiation and Its Application to Bio Micro Systems” The 7th 　International Conference on Machine Automation 2008 (ICMA2008), JAPAN ,September 24(Wednesday)-26(Friday), 2008.

(91)　Yoshiaki Ukita, Tomoya Omukai, Saki Kondo, and Yuichi Utsumi, “The Advantages of Vertical Microreactor with Multifunctional Fluid Filter for Immunoassay”, 　International Coference on Electronics Packaging 2008, 12B1-3, JAPAN, June 10- 12, 2008.

(90)　Yoshiaki Ukita, Shigeaki Yamamoto, and Yuichi Utsumi, “The Polytetrafluoroethylene Processing Characteristics of High-Energy (2keV-12keV) X-Ray and its 　Application to Microfluidics”, International Coference on Electronics Packaging 2008, 12B1-2, JAPAN, June 10- 12, 2008.

(89)　Yoshiaki Ukita, Shigeaki Yamamoto, Mitsuyoshi Kishihara, Kozo Mochiji, and Yuichi Utsumi, “Smoothing of poly-(tetrafluoroethylene) by high-energy x-ray 　induced photo-chemical reactions”, 34^th International Conference on Micro and Nano Engineering 2008, OL-P07, Greece, September 15- 18, 2008.

(88)　Yoshiaki Ukita, Saki Kondo, and Yuichi Utsumi, “Vertical microreactor stack with cross-linked capillary structure for high-sensitive ELISA”, 34^th International 　Conference on Micro and Nano Engineering 2008, 7C-2, Greece, September 15- 18, 2008.

(87)　Mitsuyoshi Kishihara, Yoshiaki Ukita, Yuichi Utsumi, and Isao Ohta, “Fabrication of a PTFE-Filled Waveguide for Millimeter-Wave Components Using SR Direct 　Etching Process”, p.301., 7th International Workshop on High-Aspect-Ratio Micro-Structure Technology 2007, FRANCE, June 2007.

(86)　Harutaka Mekaru, T. Takano, Yoshiaki Ukita, Yuichi Utsumi, and M. Takahashi, “A Si stencil mask for X-ray lithography fabricated by MEMS technology”, 　p.273., 7th International Workshop on High-Aspect-Ratio Micro-Structure Technology 2007, FRANCE, June 2007.

(85)　Katsuhide Okada, Daisuke Fukuoka Tsunemasa Saiki, Yuichi Utsumi, “One-Chip Microfluidics System by using Surface Acoustic Wave Pumping and Mixer”, 　p.151., 7th International Workshop on High-Aspect-Ratio Micro-Structure Technology 2007, FRANCE, June 2007.

(84)　Tsunemasa Saiki, Katsuhide Okada, Yuichi Utsumi, “Proposal of a Novel Liquid Flow Actuator for Lab-on-a-Chip Operated by Surface-Acoustic-Wave”, 　International Conference on Microprocess and Nanotechnology 2007, November 2007.

(83)　Daisuke Fukuoka, Katsuhide Okada, Tsunemasa Saiki, Yoshiaki Ukita, and Yuichi Utsumi, “Proposal of Continuous Flow Pumping by the Use of Surface Acoustic 　Wave Devices”, p. 147., 7th International Workshop on High-Aspect-Ratio Micro-Structure Technology 2007, FRANCE, June 2007.

(82)　Kuniyo Fujiwara, Yoshiaki Ukita, Masahiro Takeo, Seiji Negoro, Tomohiko Kanie, Makoto Katayama, and Yuichi Utsumi, “High Efficiency Mixing by the Use of 　Cross-Linked Micro Capillary Fluid Filter”, p.297., 7th International Workshop on High-Aspect-Ratio Micro-Structure Technology 2007, FRANCE, June 2007.

(81)　Kuniyo Fujiwara, Yoshiaki Ukita, Masahiro Takeo, Seiji Negoro, Tomohiko Kanie, Makoto Katayama, and Yuichi Utsumi, “High-Efficiency Mixing by the Use of 　Cross-Linked Microcapillary Fluid filter”, JSME Leading Edge Manufacturing 21st, JAPAN, November 2007.

(80)　Yoshiaki Ukita, Toshifumi Asano, Kuniyo Fujiwara, Katsuhiro Matsui, Masahiro Takeo, Seiji Negoro, Makoto Katayama, Tomohiko Kanie, and Yuichi Utsumi, 　　“Enzyme-Linked Immuno Sorvent Assay using Vertical Microreactor Stack with Microbeads”, p153. 7th International Workshop on High-Aspect-Ratio 　　Micro-Structure Technology 2007,　FRANCE, June 2007.

(80)　Yoshiaki Ukita, Kazuhiro Kanda, Shinji Matsui, Mitsuyoshi Kishihara, and Yuichi Utsumi, “Polytetrafluoroethylene Processing Characteristics using High-Energy 　X-ray”, p.291., 7th International Workshop on High-Aspect-Ratio Micro-Structure Technology 2007, FRANCE, June 2007.

(79)　Yoshiaki Ukita, Seiji Negoro, and Yuichi Utsumi, “Application of Vertical Microreactor Stack with Polystylene Microbeads to Ummuno Assay”, p.859., The 14th 　International Conference on Solid-State sensors, Actuators and Microsystems (Tranceducers 2007), FRANCE, June 2007.

(78)　Yoshiaki Ukita, Toshifumi Asano, Kuniyo Fujiwara, Katsuhiro Matsui, Masahiro Takeo, Siji Negoro, Tomohiko Kanie, Makoto Katayama, and, Yuichi Utsumi, 　　　“Vertical microreactor with fluid filters characterized by 3D-capillary-bundle for high-throughput immunoassay”, p.373., 11th International Coference on Miniatuarized 　Systems for Chemistry and Life Science(?TAS2007), FRANCE, Oct.ober 2007.

(77)　Yuichi Utsumi, Tomohiro Ikeda, Megumi Minamitani, Kazuo Suwa, “Integrated Structure of PMMA Microchannels for DNA Separation Fabricated by Deep X-ray 　Lithography and Fusion Bonding”, 51st International Conference on Electron Ion and Photon Beam Technology and Nanofabrication, PD-7.4,USA, May 2007.

(76)　Yuichi Utsumi, Yoshiaki Ukita, and Toshifumi Asano, “High Sensitive Immunoassay using Antibody Immobilized Micro Capillaries Fabricated by Deep X-ray 　Lithography”, 51st International Conference on Electron Ion and Photon Beam Technology and Nanofabrication, 6A.4, USA, May 2007.

(75)　Yuichi Utsumi, Takefumi Kishimoto, “Enhancement of the Adhesive Force of Metal films on PTFE Surface Achieved by Fast-Atom-Beam Surface Modification”, 　p.127., 7th International Workshop on High-Aspect-Ratio Micro-Structure Technology 2007, FRANCE, June 2007.

(74)　Yuichi Utsumi, Tomohiro Ikeda, Megumi Minamitani, Kazuo Suwa, “Integrated Structure of PMMA Microchannels for DNA Separation by Microchip Capillary 　Electrophoresis”, p.125., 7th International Workshop on High-Aspect-Ratio Micro-Structure Technology 2007, FRANCE, June 2007.

(73)　Yuichi Utsumi, Toshifumi Asano, Yoshiaki Ukita, Katsuhiro Matsui, Masahiro Takeo, and Seiji Negoro, “High Sensitive Immunoassay using Antibody Immobilized 　Micro Capillaries”, p.205., 7th International Workshop on High-Aspect-Ratio Micro-Structure Technology 2007, FRANCE, June 2007.

(72)　Yuichi Utsumi, Tomohiro Ikeda, Megumi Minamitani, Kazuo Suwa, “Stacked Structure of PMMA Microchannels for DNA Separation Fabricated by Deep X-ray 　Lithography and Fusion Bonding”, p.1161., 11th International Coference on Miniatuarized Systems for Chemistry and Life Science (?TAS2007), FRANCE, October 　　2007.

(71)　Makoto Fukuda, Kimiyoshi. Deguchi, M.asanori Suzuki, and Yuichi Utsumi, “Three-Dimensional Patterning Using Fine Step Motion in SR Lithography” The 50^th 　　International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2006, pp.507-508.

(70)　Yoshiaki Ukita, Kazuhiro Kanda, Shinji Matsui, and Yuichi Utsumi,” Fabrication of  Micro Mold by Synchrotron Radiation Direct Etching of CYTOP for UV 　　polymerization Embossing” The 50^th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2006, pp.146-147.

(69)　Yoshiaki Ukita, Kazuhiro Kanda, Shinji Matsui, and Yuichi Utsumi,” Fabrication of  PTFE Microstructure using Synchrotron Radiation Direct Etching for 　　Microfluidics Application” The 50^th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2006, pp.509-510.

(68)　Yoshiaki Ukita, Kazuhiro Kanda, Shinji Matsui, Mitsuyoshi Kishihara, and Yuichi Utsumi,” Fabrication of Polytetrafluoroethylene Microparts by High-Energy X-ray 　Induced Etching” International Microprocess and Nanotechnology Conference, 2006, pp306-307.

(67)　Yuichi Utsumi, Toshifumi Asano, Yoshiaki Ukita, Katsuhiro Matsui, Masahiro Takeo, and Seiji Negoro, ” Enzyme-Linked Immunosorbent Assay Using Vertical 　Micro Reactor Stack for the Detection of Biomolecules” International Microprocess and Nanotechnology Conference, 2006, pp304-305.

(66)　Yuichi Utsumi, Takefumi Kishimoto, Koichi Okuda, Tadashi Hattori, Yoshiaki Ukita, and Toshifumi Asano, Leading Edge Manufacturing 21^st, JAPAN, Oct. 　　　　19-22, 2005.

(65)　Yoshiaki Ukita, Kuniyo Fujiwara, Toshifumi Asano, Takuya Yokoyama, Tsunemasa Saiki and Yuichi Utsumi, Novel Characteristics of Multifunctional Fluid Filter 　Fabricated by High Energy SR Lithography, MNC2005, 26B-3-4, JAPAN, Oct. 26-28, 2005.

(64)　Yuichi Utsumi, Takefumi Kishimoto, Tadashi Hattori, and Hirotsugi Hara, “Large Area and Wide Dimensions X-ray Lithography Using Energy Variable Synchrotron 　Radiation”, High Aspect Radio Micro Structure Technology, 2005, pp.84-85.

(63)　Yuichi Utsumi, Yusuke Hitaka, and Yoshiaki Ukita, “Planar Micro Reactor for Biochemical Application made from Silicon and Polymer”, High Aspect Radio Micro 　Structure Technology, 2005, pp.194-195.

(62)　Yuichi Utsumi, Toshifumi Asano, Yoshiaki Ukita, Katsuhiro Matsui, Masahiro Takeo and Seiji Negoro, “Proposal of a New Micro Reactor for Vertical Chemical 　Operation”, The 49^th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2005, pp.123-124.

(61)　Yoshiaki Ukita, Toshifumi Asano, Yuichi Utsumi, “Fluid Filter Fabricated by Deep X-ray Lithography for Micro Fluidics”, High Aspect Radio Micro Structure 　　Technology, 2005, pp.88-89.

(60)　Toshifumi Asano, Katsuhiro Matsui, Yoshiaki Ukita, Masahiro Takeo, Seiji Negoro and Yuichi Utsumi, “Proposal of A New Micro Reactor for Vertical Chemical 　Operation”, High Aspect Radio Micro Structure Technology, 2005, pp.14-15.

(59)　Toshifumi Asano, Yoshiaki Ukita, Katsuhiro Matsui, Masahiro Takeo, Seiji Negoro and Yuichi Utsumi, “Study of Vertical Fluid Flow Control for 3D Bio-micro 　Reactor”, International Symposium on Molecule-Based Information Transmission and Reception, 2005 , pp.6-12.

(58)　Masatake Matsumoto, Kinji Takiguchi, Makoto Tanaka, Yoichi Hunabiki, Hiroaki Takeda, Atsushi Momose, Yuichi Utsumi, and Tadashi Hattori, “Fabrication of 　Diffraction Grating for X-ray Talbot Interferometer”, High Aspect Radio Micro Structure Technology, 2005, pp.22-23.

(57)　Kazuyoshi Idei, Harutaka Mekaru, Shingo Kitamura, Yoichi Murakoshi, Ryutaro Maeda, Yuichi Utsumi, and Tadashi Hattori, “Development of Emboss Roll with 　Precise Micro Patterns by 3D X-ray Lithography”, 2005, pp.242-243.

(56)　Yuichi Utsumi, Toshifumi Asano, Tadashi Hattori, Katsuhiro Matsui, Masahiro Takeo, and Seiji Nerogo, “A New Micro Chemical Reactor Stack for Vertical Fluid 　Flow Operation”, International Microprocess and Nanotechnology Conference, 2004, pp.248-249.

(55)　Yuichi Utsumi, Takefumi Kishimoto, Tadashi Hattori, and Hirotsugi Hara, “Proposal of Large Exposure Area and Wide Dimensional X-ray Lithography for LIGA 　Process using Energy Variable Synchrotron Radiation”, International Microprocess and Nanotechnology Conference, 2004, pp.104-105.

(54)　Yuichi Utsumi, Takefumi Kishimoto, Harutaka Mekaru, and Tadashi Hattori, “The Large-area Deep X-ray Lithography System Using Synchrotron Radiation”, 　International Conference on Electrical Engineering, 2004, pp.608-613.

(53)　Yuichi Utsumi, Takefumi Kishimoto, Tadashi Hattori, and Hirotsugi Hara, “Advanced X-ray Lithography System for LIGA process Using Energy Variable 　Synchrotron Radiation”, 4^th International Workshop on Microfactories, 2004, pp.275-280.

(52)　Yuichi Utsumi, Megumi Minamitani, and Tadashi Hattori, “A High Luminosity Lighting-Panel for Liquid Crystal Displays fabricated by Deep X-ray Lithography”, 　MICRO SYSTEM Technologies 2003, pp.535-537.

(51)　Yuichi Utsumi, Motoaki Ozaki, Sigeru Terabe, and Tadashi Hattori, “Improvement of Capillary Electrophoresis Property for Microchannels Fabricated by Deep 　X-ray Lithography”, High Aspect Radio Micro Structure Technology, 2003, pp.231-232.

(50)　Nobuji Sakai, Kentaro Tada, Yuichi Utsumi, and Tadashi Hattori “Advanced Ultra-Thick Negative Photoresist with High Sensitivity for X-Ray and UV Deep 　Lithography, High Aspect Radio Micro Structure Technology, 2003, pp.15-16.

(49)　Megumi Minamitani, Yuichi Utsumi, and Tadashi Hattori, “3D Microstructure Fabrication for a High Luminosity Lighting-Panel for LCD Using Synchrotron 　Radiation”, High Aspect Radio Micro Structure Technology, 2003, pp.213-214.

(48)　Takeshi Kitadani, Yuichi Utsumi, and Tadashi Hattori, “Fabrication of Nickel Micro Mold Inserts by The LIGA Process Using Synchrotron Radiation from 　　　　　“NewSUBARU””, Technical Digest of the 20th Sensor Symposium 2003, pp.231-236.

(47)　Tsunemasa Saiki, Motoaki Ozaki, Yuichi Utsumi, Hideaki Hisamoto, and Tadashi Hattori, “Comparison of the Performance of Polymer-Based Capillary 　Electrophoresis Microchips Fabricated by Using Resist Molds Prepared by Synchrotron Radiation Lithography and Ultraviolet Light Lithography”, MICRO SYSTEM 　Technologies 2003, pp.517-519.　

(46)　Yuichi Utsumi, Motoaki Ozaki, Shigeru Terabe, and Tadashi Hattori, “Effects of Improved Microchannel Structures to The Separation Characteristics of Microchip 　Capillary Electrophoresis, International Microproceesses and Nanotechnology Conference, 2002, pp.154-155.

(45)　Yuichi Utsumi and Hattori Tadashi, “An Approach of High Efficiency Fuel Reformer Using High Aspect Metal Structure formed by Synchrotron Radiation LIGA 　Process”, Power MEMS International Workshop on Power MEMS, 2002, , pp.84-85.

(44)　Yuichi Utsumi, Takeshi Kitadani, and Tadashi Hattori, “Optimization of Nickel Electroplating for High Aspect Ratio LIGA Mold Inserts Fabricated by Synchrotron 　Radiation from “NewSUBARU””, JMSE/AMSE International Conference on Materials and Processing 2002, pp.585-588.

(43)　Yuichi Utsumi, Motoaki Ozaki, Shigeru Terabe, and Tadashi Hattori, “Prototyping of PDMS Micro Capillary Electrophoresis Chips”, Proceedings of The 1^st 　　　Pacific Rim Meeting of Techno-Linkage of Microfabrication, 2002, pp.79-83.

(42)　Yuichi Utsumi, Motoaki Ozaki, Shigeru Terabe, Tadashi Hattori, and Etsuo Shinohara, “Fabrication of PDMS Micro Capillary Electrophoresis Chips”, Technical 　Digest of the 19th Sensor Symposium 2002, pp.43-46.

(41)　Takeshi Kitadani, Yuichi Utsumi, and Tadashi Hattori, “Fabrication of Nickel Micro Mold Inserts by The LIGA Process Using Synchrotron Radiation from 　　　　　“NewSUBARU”, Technical Digest of the 19th Sensor Symposium 2002, pp.74-77.

(40)　Takeshi Kitadani, Yuichi Utsumi, and Tadashi Hattori, “Fabrication of The Micro Molding Inserts by The LIGA Process Using Synchrotron Radiation from 　　　　　“NewSUBARU”, Proceedings of The 1^st Pacific Rim Meeting of Techno-Linkage of Microfabrication, 2002, pp.75-78.

(39)　Motoaki Ozaki, Yuichi Utsumi, Shigeru Terabe, and Tadashi Hattori, “Fabrication of Plastic Microchip for Electrophoresis Using UV Polymerization”, 　JMSE/AMSE International Conference on Materials and Processing 2002, pp.490-493.

(38)　Harutaka Mekaru, Yuichi Utsumi, and Tadashi Hattori, “Current Status of LIGA Process at “NewSUBARU””, JMSE/AMSE International Conference on 　Materials and Processing, 2002, pp.589-592.

(37)　Harutaka Mekaru, Yuichi Utsumi, and Tadashi Hattori, “A deep X-ray Lithography in the “NewSUBARU””, International Microproceesses and Nanotechnology 　Conference, 2002, pp.156-157.

(36)　Yuichi Utsumi and Tadashi Hattori, “Synthesis of Ammonium and Organic Compounds from Air Component Gasses by Soft X-ray Induced Reactions at 　Atmospheric Pressure”, 12th U.S. National Synchrotron Radiation Instrumentation Conference, 2001, pp.70.

(35)　Yuichi Utsumi and Tadashi Hattori, “A New Approach to Microfabrication and Synthesization Using Synchrotron Radiation Excited Chemical Reaction”, High 　Aspect Radio Micro Structure Technology 2001, pp.187-188.

(34)　Yuichi Utsumi and Tadashi Hattori, “A New Approach to Microfabrication Using Synchrotron Radiation Induced Photochemical Reaction”, Technical Digest of the 　18th Sensor Symposium 2001, pp.77-80.

(33)　S. Iwamoto, K. Maenaka, Y. Utsumi, T. Hattori and T. Matsuda, “A Study of X-ray Masks for Deep Lithography”, Technical Digest of the 18th Sensor 　Symposium 2001, pp.69-72.

(32)　K. Maenaka, S. Ioku,　S. Iwamoto, Y. Utsumi and T. Hattori, “X-ray Masks for Deep Lithography:”, High Aspect Radio Micro Structure Technology, 2001, 　pp.19-20.

(31)　Tadashi Hattori, Harutaka Mekaru, and Yuichi Utsumi, “A New Approach to 3D-Microstructure Fabrication Utilizing Hard X-ray Lithography of SR”, 12th U.S. 　National Synchrotron Radiation Instrumentation Conference, 2001, pp.64.

(30)　Tadashi Hattori, Harutaka Mekaru and Yuichi Utsumi, “Quasi 3D Microstructure Fabrication Technique Utilizing Hard X-Ray Lithography of Synchrotron Radiation　”, High Aspect Radio Micro Structure Technology 2001, pp. 21-22.

(29)　Etsuo Shinohara, Nobuyoshi Tajima, Jun Funazaki, Koichi Tashiro, Shuichi Shoji,　Yuichi Utsumi and Tadashi Hattori, “Free Flow Electrophoresis Module For 　Rapid Sample Preparation”, Micro Total Analysis Systems 2001, pp.125-126.

(28)　Yuichi Utsumi, Tomoaki Kawamura, Yoshio Watanabe, Kunihiko Uwai, Hiroki Hibino, Toshiro Ogino, Junji Matsui,  Yoshiyuki  Tsusaka, and Yasushi kagoshima, 　”Grazing Incidence Surface X-ray Diffractometer for Gas Phase Crystal Growth Using High Brilliance X-ray of SPring-8”, The 65th Okazaki International Conference, 　2000, pos34.

(27)　Yuichi Utsumi, Harutaka Mekaru, Tadashi Hattori, “Application of Synchrotron Radiation to Microfablication”, 12th The Material Research Society 　Japan, 2000, 　K1-014.

(26)　Yuichi Utsumi, Harutaka Mekaru, Tadashi Hattori, Shinji Matsui and Takayasu Mochizuki, “Chemical Application Research Using "New SUBARU " 1.5 GeV 　Storage Ring” International Chemical Congress of 　Pacific　Basin　Societies, 2000, PHYS 127.

(25)　Tomoaki Kawamura, Yuichi Utsumi, Kunihiko Uwai, Yoshio Watanabe, Junji Matsui, Yasushi Kagoshima, Yoshiyuki Tsusaka, and Seiji Fujikawa, “In Situ 　　　Observation of InP(001) Surface under Hydrogen Atmospheric Environment Using Grazing X-ray Diffraction”, The 10th International Conference on Metalorganic 　Vapor Phase Epitaxy 2000, pp.45-47.

(24)　Harutaka Mekaru, Yuichi Utsumi, and Tadashi Hattori, “Beamline BL11 for LIGA Process at The New SUBARU”, The 7th International Conference on 　Synchrotron Radiation Instrumentation, 2000, POS2-151.

(23)　Yuichi Utsumi, Tomoaki Kawamura, Yoshio Watanabe, Kunihiko Uwai, Muneyuki Sugiyama, Junji Matsui, Yoshiyuki  Tsusaka, and Yasushi kagoshima, “　　　Development of Grazing-Incidence X-ray Scattering Apparatus for In Situ Analysis of Surface Structure During MOVPE”, The 1st UK-Japan International Seminar of 　Application of Synchrotron Radiation to Studies of Nano-Structured Materials, 1999, pp.80-84.

(22)　Jun-ichi Takahashi, Hitomi Masuda, Takeo Kaneko, Kensei Kobayashi, Takeshi Saito, Teruo Hosokawa, and Yuichi Utsumi, “Abiotic Synthesis of Amino Acid 　Precursors by X-ray and Vacuum Ultraviolet Irrdiation from Synchrotron Radiation”,12th International Conference on Vacuum Ultra Violet Radiation Physics (VUV12), 　1998, Mo035.

(21)　Jun-ichi Takahashi,Yuichi Utsumi, and Teruo Hosokawa, “Particle Precipitation on X-ray Mask Surfaces by SR-induced Fixation of  Atmospheric Gas Molecules”, 　12th International Conference on Vacuum Ultra Violet Radiation Physics (VUV12) , 1998, Tu127.

(20)　Tsuneyuki Haga,Yuichi Utsumi, and Seiichi Itabashi, “Soft X-ray Ellipsometer using Transmission Multilayer Polarizers”, International Symposium on Optical 　Science, Engineering, and Instrumentation (SPIE 43rd Annual Meeting), 1998,  pp.117-127.

(19)　Tomoaki Kawamura, Yuichi Utsumi, Muneyuki Sugiyama, Yoshio Watanabe, Kunihiko Uwai, Junji Matsui, Yasushi Kagoshima, Yoshiyuki  Tsusaka, and Seiji 　　Fujikawa, “Surface X-ray Diffractometer for MOVPE Growth at Spring-8”,  American Vacuum Society 45th International Symposium, 1998, pp. 167-171.

(18)　Yuichi Utsumi, “Si  Photoepitaxy Induced by Synchrotron Radiation”  (INVITED) ,  SPIE Conference -Laser applications in micrtoelectronic and Optoelectronic 　Manufacturing II, (1997), pp.78- 89.

(17)　Yuichi Utsumi, Jun-ichi Takahashi, and Teruo Hosokawa, “Synchrotron Radiation-Induced Formation of Salt Particles on X-ray Lithography Mask in The　Atmosphere”,  6th International Conference on Synchrotron Radiation Instrumentation, 1997, pp.234.

(16)　Jun-ichi Takahashi , Yuichi Utsumi,, and Teruo Hosokawa, “The Beamline for SR-Induced Photochemical Reaction Using Synchrotron Radiation”, 6th International 　Conference on Synchrotron Radiation  Instrumentation, 1997, pp.235.

(15)　Housei Akazawa, and Yuichi Utsumi, “ Photodesorption and Photolysis during Synchrotron Radiation Excited Boron Film Deposition from Decaborane”, 11th 　International Conference on Vacuum Ultra Violet  Radiation Physics (VUV11), 1995,  pp.M40.

(14)　Housei Akazawa, and Yuichi Utsumi, “Temperature Effect in Synchrotron Radiation Excited Si Atomic Layer Epitaxy Using Disilane”, Atomic Layer Epitaxy and 　Related Surface Processes (ALE-3), 1994, pp. 114-115.

(13)　Yuichi Utsumi, Housei Akazawa, and Masao Nagase, “Perfect Selective Si Epitaxial Growth Realized by Synchrotron Radiation Irradiation during Disilane 　Molecular Beam Epitaxy”, Material Research Society Fall Meeting, 1993, pp 525-531.

(12)　Housei Akazawa, Yuichi Utsumi, and Masao Nagase, “Specific Growth kinetics and Film Properties in Synchrotron Radiation Excited Silicon Epitaxy with Disilane”, 1st International Conference on Photo-Excited Processes and Applications, 1993, pp53-58.

(11)　Housei Akazawa, Masao Nagase, and  Yuichi Utsumi, “Synchrotron Radiation-Stimulated Evaporation and Defect Formation of a-SiO₂”, 7th International 　　Conference on Radiation Effects in Insulators, 1993,  pp.36-41.

(10)　Tsuneo Urisu, Junichi Takahashi, Yuichi Utsumi, Tetsuo Akutsu, and Kozo Kuchitsu,  “Synchrotron Radiation Assisted Si Epitaxial Growth Using Si₂H₆ and Si₂H₂　Cl₂ Gases  -Properties in the Low Temperature Region-“, Second International Symposium on Electrochemical Processing of Tailored Materials, 1993, pp. 1562-1565.

(9)　　Masao Nagase, Yuichi Utsumi, Housei Akazawa, and Tsuneo Urisu, “ Site Specific Oxygen Desorption from Molybdenum Oxide by SR Irradiation and Surface 　Cleaning Applications”, Micro Process Conference, 1992, pp.182-183.

(8)　　Yuichi Utsumi, Jun-ichi Takahashi, Housei Akazawa, and Tsuneo Urisu, “The Crystallinity Improvement by the SR Irradiation in the Low Temperature Si Epitaxial 　Growth Using Disilane”, International Micro Process Conference, 1991, pp.260-261.

(7) 　　Tsuneo Urisu, Jun-ichi Takahashi, Housei Akazawa, and Yuichi Utsumi, “Low Temperature Semiconductor Process by Synchrotron Radiation”, The First 　　　　　International  Meeting  on  Optoelectronic  and  Technology Development, 1991, pp. 48-55.

(6)　　Jun-ichi Takahashi, Yuichi Utsumi and Tsuneo Urisu, “Photochemical Area-Selective Etching of Si and SiO₂ Using Synchrotron Radiation”, Materials Research 　Society Fall Meeting 1990, 158, pp.53-58.

(5)　　Housei Akazawa, Yuichi Utsumi, Jun-ichi Takahashi and Tsuneo Urisu, “Photo-Stimulated Evaporation of SiO₂ Films by Synchrotron Radiation and Application to 　Low Temperature Cleaning of Si (100)”, 22nd Conference on Solid State Devices and Materials, 1990, pp.1171-1172.

(4)　　Yuichi Utsumi, Jun-ichi Takahashi, Tsuneo Urisu, and Hideki Maezawa, “A Soft X-ray W/Be Multilayer and Its Application to A Diffraction Grating”, 3rd 　International Conference on Synchrotron Radiation Instrumentation, 1988, pp.2024.

(3)　　Tsuneo Urisu, Yuichi Utsumi, Jun-ichi Takahashi, Mamoru Kitamura, and Hakaru Kyuragi, “Synchrotron Radiation Induced Semiconductor Processings”, 3rd 　International Conference on Synchrotron Radiation Instrumentation”, 1988, pp. 2157.

(2)　　Tsuneo Urisu, Hakaru Kyuragi,  Yuichi Utsumi,  Jun-ichi Takahashi, and Mamoru Kitamura,  “Synchrotron Radiation Induced Semiconductor Processings: 　　Photochemical vapor deposition and Etching”, Micro Process Conference, 1988, pp A-152.

(1)　　Jun-ichi Takahashi, Yuichi Utsumi and Tsuneo Urisu, “Reaction Mechanisms with Synchrotron Radiation-Stimulated Etching of Si and SiO₂”, The 20th Conference 　on Solid State Devices and Materials, 1988, pp.73-76.