Facility
Purpose of BL07
The beam line 7 (BL-07) was constructed for the research of new material creation by SR-nanotechnology. For the investigation of the new-material development using SR, two kinds of light source are demanded in the soft X-ray region. One is a high-photon flux and energy tunable beam line for the SR-stimulated processes, such as an inner-shell excitation leading to selective photochemical reaction. Another is a high-resolution beamline for the analysis on the produced materials, such as photoelectron spectroscopy and fluorescent X-ray emission spectroscopy. BL-07 consists of two-branch lines. At the high-flux beamline (BL7A), Multilayered-mirror (MLM) monochromator, which has high reflectivity in the soft X-ray region, was installed. On the other hand, on the material-analysis beamline (BL7B), a constant-deviation monochromator, consisting of a demagnifying spherical mirror and varied line spacing plane grating (VLSPG), which can provide to high resolution, simple wavelength scanning with fixed slits was mounted.
Layout
Specifications of the mirrors and filters(BL07A)
Specifications of the mirrors
a) Optical Layout
b) Acceptances: 2.2 mrad (horizontal), 3.8 mrad (vertical)
c)Incident angle: 3 deg., Radius R=312400 mm、Size: 400x40x40mm3
d)Material: Si, Coating: Pt
Specifications of the filters
Al 100nm、Ag 100nm Cr 500nm, Ni 500nm
End station
a) Irradiation experiment, Inner-shell excitation process
b) Sample size: 20(W)x16(H)mm2
c) Exposure area: 20(W)x16(H)mm2
d) Vacuum:< 10-6Pa
e) Photon Flux
2x1016photon/s (at 95eV, 100mA)
4x1013photon/s (at 300eV, 100mA)
BL07B
Schematic layout of the BL07B
Specification of the mirrors(BL07B)
Schematic mirror layout of the BL07B
M0 mirror (toroidal mirror)
a)Acceptance angle, horizontal:2.2mrad, vertical:2.4mrad
b)Incidence angle 3°, R=125189mm, r=356mm, size=400× 40× 40mm3
c)Ni coated Si
M1 mirror (spherical mirror)
a)incidence angle=2°, R=100288mm, size=220× 30× 18.6mm3
b)Ni coated Si
M2 mirror (toroidal mirror)
a)incidence angle=4°, R=20856mm, size=150× 30× 17.8mm3
b)Ni coated Si
No filter
Specification of the monochromator
a)Constant-deviation monochromator
b)Specification of the grating
| Groove density (lines/mm) |
Groove depth (nm) |
Duty ratio | Energy (eV) |
|
|---|---|---|---|---|
| G1 | 600 | 18.0 | 0.4 | 50-150 |
| G2 | 1200 | 9.0 | 0.4 | 150-300 |
| G3 | 2400 | 4.5 | 0.4 | 300-800 |
Specification of the end station
a)Photoemission spectroscopy, Absorption
b)Sample size: Solid at the size of 5× 5mm2
c)Exposure area:1×3mm2
d)Ultra high Vacuum:solid samples, which do not pollute the vacuum vessel, are possible to measure the photoemission and absorption spectra.
e)The number of photons: 1011～1013photon/s
Spectrum of the short undulator
Mounted Detector
Quadrupole mass analyzer
