○ 2nd International Conference on New Diamond and Nano Carbons,
2008, Taipei, The Republic of China.
・ Graphitization of thin films formed by focused-ion-beam chemical-vapor-deposition.
K. Kanda, J. Igaki, N. Yamada, R. Kometani, and S. Matsui,
○ 1st Asian Symposium on NanoImprint Lithography, 2008, Seoul, Korea.
・ Evaluation of Release Effect of Antisticking Layer for Nanoimprint
Resin by
Scanning Probe Microscopy.
M. Okada, M. Iwasa, K. Nakamatsu, K. Kanda, Y. Haruyama, and S. Matsui,
○ The Conference of Photopolymer Science and Technology 08, Chiba, Japan,
・ Evaluation of Fluorinated Diamond Like Carbon as Antisticking Layer
by
Scanning Probe Microscopy,
M. Okada, M. Iwasa, N. Yamada, K. Nakamatsu, K. Kanda, Y. Haruyama, and S. Matsui,
○ The 26th International Conference of Photopolymer Science and Technology Materials &
Processes for Advanced Microlithography and Nanotechnology.
June 30 - July 3, 2009 (University Convention Hall Chiba University,
Chiba, Japan) [A-28]
・ Room-Temperature Nanoimprint using Sol-Gel ITO film,
Y. Kang, M. Okada, K. Nakamatsu, K. Kanda, Y. Haruyama and S. Matsui,
○ The 26th International Conference of Photopolymer Science and Technology Materials &
Processes for Advanced Microlithography and Nanotechnology.
June 30 - July 3, 2009 (University Convention Hall Chiba University,
Chiba, Japan) [A-29].
・ Room-Temperature Nanoimprint using Liquid-Phase Hydrogen Silsesquioxane
with PDMS mold,
Y. Kang, M. Okada, K. Nakamatsu, K. Kanda, Y. Haruyama and S. Matsui,
○ 34th Micro and Nano Engineering 2008, Athens, Greece
・ Evaluation of Heat Durability for Antisticking Layer in Nanoimprint
by Scanning Probe Microscopy,
M. Okada, M. Iwasa, K. Nakamatsu, K. Kanda, Y. Haruyama, and S. Matsui,
・ Nanoimprinting using Release Agent Coated Polymethylmethacrylate,
M. Okada, M. Iwasa, K. Nakamatsu, K. Kanda, Y. Haruyama, and S. Matsui,
○ The 7th International Conference on Nanoimprint and Nanoprint Technology,
2008, Kyoto, Japan
・ Antisticking Layer Formed by CHF3 Plasma irradiation for Nanoimprint Molds,
M. Okada, K. Nakamatsu, Y. Kang, K.Kanda, Y. Haruyama, and S. Matsui,
・ Room Temperature Nanoimprinting on a Release Agent Coated Hydrogen
Silsesquioxane,
M. Okada, K. Nakamatsu, Y. Kang, K.Kanda, Y. Haruyama, and S. Matsui,
・ Nanoscale Release Effect Measurement of Antisticking Layer for Nanoimprint
Resin by
Scanning Probe Microscope,
M. Okada, K. Nakamatsu, Y. Kang, K.Kanda, Y. Haruyama, and S. Matsui,
○ The 7th International Conference on Nanoimprint and Nanoprint Technology (NNT’08)
October 13-15, 2008 (Kyoto Inter national Conference Center, Kyoto,
Japan) [14B2-5-54].
・ Nanofabrication of ITO film by Room-Temperature Nanoimprint”,
Y. Kang, M. Okada, K. Nakamatsu, K. Kanda, Y. Haruyama and S. Matsui
,
○ American Vacuum Society 55th International Symposium, 2008, Boston, USA,
・ Nanoscale Release Effect of Antisticking Layer for Nanoimprint Resin
Characterized by Scanning Probe Microscopy,
M. Okada, M. Iwasa, K. Nakamatsu, K. Kanda, Y. Haruyama, and S. Matsui,
○ 21st International Microprocesses and Nanotechnology Conference, 2008,
Fukuoka, Japan.
・ Characteristics of Antisticking Layer Formed by CHF3 Plasma irradiation
for Nanoimprint Molds,
M. Okada, K. Nakamatsu, Y. Kang, K.Kanda, Y. Haruyama, and S. Matsui,
・ Room Temperature Nanoimprint using Release Agent Coated Hydrogen Silsesquioxane
Resin,
M. Okada, K. Nakamatsu, Y. Kang, K.Kanda, Y. Haruyama, and S. Matsui,
・ Examination of Nanoscale Release Effect between Antisticking Layer and Nanoimprint Resin by
Scanning Probe Microscope,
M. Okada, K. Nakamatsu, Y. Kang, K.Kanda, Y. Haruyama, and S. Matsui,
○ 2008 International Microprocesses and Nanotechnology Conference（MNC'08）
October 27-30, 2008 (JAL Resort Sea Hawk Hotel Fukuoka, Japan) [29D-9-134].
・ Oxygen Plasma Irradiation Effect onto ITO patterned by Room-Tempareture
Nanoimprint,
Y. Kang, M. Okada, K. Nakamatsu, K. Kanda, Y. Haruyama and S. Matsui,
○ The IUMRS International Conference in Asia 2008 (IUMRS-ICA 2008), Nagoya,
Japan.
・ Variation on Local Structure of DLC Thin Films Formed with FIB-CVD
Method by Annealing,
K. Kanda, Makoto Okada, and Shinji Matsui,
・ Nanoimprinting using CHF3 Reactive Ion Etching Plasma Irradiated Mold,
M. Okada, K. Nakamatsu, Y. Kang, K. Kanda, Y. Haruyama, and S. Matsui,
・Nanoimprint Mold Fabrication using Fluorinated Diamond-like Carbon,
Y. Kang, M. Okada, K. Nakamatsu, K. Kanda, Y. Haruyama and S. Matsui,
○ The 53rd International Conference on Erectron, Ion, and Photon Beam Technology
and
Nanofabrication (EIPBN'09) May 26-29, 2009 (Marco Island Marriott Resort,
Golf Club and
Spa Marco Island, Florida) [6C-3].
・ Effect of UV Irradiation on Sol-Gel ITO Nanopatterns Replicated by
Room-Temperature Nanoimprint,
Y. Kang, M. Okada, K. Nakamatsu, K. Kanda, Y. Haruyama and S. Matsui,
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